ZINC DIFFUSION IN ALXGA1-XP

被引:7
作者
KLEINKNECHT, HP [1 ]
WIDMER, AE [1 ]
机构
[1] RCA LABS LTD,CH-8048 ZURICH,SWITZERLAND
关键词
D O I
10.1016/0038-1101(76)90180-5
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1005 / &
相关论文
共 13 条
[1]   ANOMALIES IN SOLUBILITY FOR ZN IN ALXGA1-XAS [J].
CAMPBELL, DR ;
SHIH, KK .
APPLIED PHYSICS LETTERS, 1971, 19 (09) :330-&
[2]   DEPENDENCE OF DIFFUSION COEFFICIENT ON FERMI LEVEL - ZINC IN GALLIUM ARSENIDE [J].
CASEY, HC ;
PANISH, MB ;
CHANG, LL .
PHYSICAL REVIEW, 1967, 162 (03) :660-+
[3]  
CHICOTKA RJ, 1971, NAS122169 CONTR
[4]  
CRANK J, 1964, MATH DIFFUSION, P39
[5]   BILDUNGSENTHALPIE VON ALUMINIUMPHOSPHID [J].
KISCHIO, W .
JOURNAL OF INORGANIC & NUCLEAR CHEMISTRY, 1965, 27 (03) :750-&
[6]   (GAAL)P OPTICAL-WAVEGUIDE MODULATORS FABRICATED BY LIQUID-PHASE EPITAXY [J].
KLEINKNECHT, HP ;
WIDMER, AE .
JOURNAL OF APPLIED PHYSICS, 1974, 45 (08) :3453-3459
[7]  
NAMIZAKI H, 1974, J APPL PHYS, V45, P2785, DOI 10.1063/1.1663670
[8]   CHARACTERISTICS OF JUNCTION-STRIPE-GEOMETRY GAAS-GAALAS DOUBLE-HETEROSTRUCTURE LASERS [J].
NAMIZAKI, H ;
KAN, H ;
ISHII, M ;
ITO, A ;
SUSAKI, W .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1974, 13 (10) :1618-1623
[9]   ZINC DIFFUSION INTO GALLIUM PHOSPHIDE UNDER HIGH AND LOW PHOSPHORUS OVERPRESSURE [J].
NYGREN, SF ;
PEARSON, GL .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (05) :648-&
[10]  
SUSAKI W, 1973, J APPL PHYS, V44, P2993