HIGHLY C-AXIS-ORIENTED PB(ZR, TI)O3 FILMS PREPARED BY SPUTTERING

被引：11

作者：

FUKAMI, T

MINEMURA, I

HIROSHIMA, Y

OSADA, T

机构：

[1] Department of Electrical and Electronic Engineering, Shinshu University, Nagano

[2] Kawasaki Heavy Industries, Ltd, Kawasaki-cho, Akashi

[3] Kawasaki Steel Co., Ltd, Utsunomiya

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1991年 / 30卷 / 9B期

关键词：

PZT; MAGNETRON SPUTTERING; ATOMIC LAYER EPITAXY; STOICHIOMETRY; DEFECTS IN FILMS; FERROELECTRIC HYSTERESIS LOOP;

D O I：

10.1143/JJAP.30.2155

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A newly developed tripole magnetron sputtering system, which has a third magnetic pole, has been applied to deposit PZT films in the atomic layer epitaxy mode. A set of experimental results revealed that the resultant films were highly c-axis orientated on (100) MgO substrate and that the deviation from stoichiometry in the films enhanced asymmetric properties of the P-E loop patterns.

引用

页码：2155 / 2158

页数：4

共 15 条

[1] PLANAR MAGNETRON SPUTTERING CATHODE WITH DEPOSITION RATE DISTRIBUTION CONTROLLABILITY [J].