STRUCTURAL AND ELECTRON-TRANSPORT PROPERTIES OF MO/AL MULTILAYER FILMS

Metallic Mo/Al multilayers have been successfully fabricated by a magnetron-radiofrequency sputtering system. The modulation wavelength ranged from 640 down to 15 AA. Detailed structural properties were studied using X-ray and electron diffraction methods. These studies indicated that the films are polycrystalline with high structural order, BCC Mo(110) and FCC Al(111) parallel to the films. Model calculations based on paracrystal theory were performed to analyse the X-ray diffraction patterns. In-plane resistivity was measured as a function of the modulation wavelength and temperature. The resistivity did not saturate even at very small wavelength and negative temperature gradients were usual below 60 AA, where enhancements of the superconducting transition temperature were observed.