HIGH-QUALITY A-SIGE ALLOYS PREPARED BY NEW METHODS - A-SIGE-H-F AND SUPERLATTICE STRUCTURE FABRICATED BY PHOTO-CVD

被引：13

作者：

TSUDA, S

TARUI, H

HAKU, H

NAKASHIMA, Y

HISHIKAWA, Y

NAKANO, S

KUWANO, Y

机构：

[1] Sanyo Electric Co, Research Cent,, Hirakata, Jpn, Sanyo Electric Co, Research Cent, Hirakata, Jpn

来源：

关键词：

ACKNOWLEDGEMENT This work was supported in part by NEDO as a part of the Sunshine Project under the Ministry of International Trade and Industry;

D O I：

10.1016/0022-3093(85)90792-6

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：845 / 848

页数：4