DEFECT FORMATION AND CROSSOVER-BEHAVIOR IN THE DYNAMIC SCALING PROPERTIES OF MOLECULAR-BEAM EPITAXY

被引:24
作者
DASSARMA, S
LANCZYCKI, CJ
GHAISAS, SV
KIM, JM
机构
[1] Department of Physics, University of Maryland, College Park
来源
PHYSICAL REVIEW B | 1994年 / 49卷 / 15期
关键词
D O I
10.1103/PhysRevB.49.10693
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Stochastic simulation results, appropriate for molecular-beam epitaxy, involving ballistic deposition and thermally activated Arrhenius diffusion of adatoms, are presented for one- and two-dimensional substrates, allowing for overhangs and bulk vacancies. The asymptotic Kardar-Parisi-Zhang universality is found to be triggered by a sudden nucleation of large-scale defect formation in the growing film that shows a distinct dependence on dimensionality. The prenucleation transient behavior, which may be of experimental relevance due to the low defect content, is associated with standard solid-on-solid universality classes.
引用
收藏
页码:10693 / 10698
页数:6
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