RATE CONSTANTS FOR THE REACTIONS OF OH WITH HFC-134A (CF3CH2F) AND HFC-134 (CHF2CHF2)

被引：21

作者：

DEMORE, WB

机构：

[1] Jet Propulsion Laboratory, California Institute of Technology

来源：

GEOPHYSICAL RESEARCH LETTERS | 1993年 / 20卷 / 13期

关键词：

D O I：

10.1029/93GL01336

中图分类号：

P [天文学、地球科学];

学科分类号：

07 ;

摘要：

Rate constants for the reactions of OH with HFC-134a (CF3CH2F) have been measured relative to CH3CCl3, CH4 and HFC-125 (CF3CHF2). Rate constants for HFC-134 (CF2HCF2H) were measured relative to CH3CCl3, HFC-125, and HFC-134a. The measurements were made in a slow-flow, temperature controlled photochemical reactor, and were based on relative rates of disappearance of the parent compounds as measured by FTIR spectroscopy. The temperature range was 298-358 K. Hydroxyl radicals were generated by 254 nm photolysis of O3 in the presence of water vapor. Using current NASA/JPL rate constants for the reference compounds, temperature dependent rate constants of both compounds were derived. Rate constants obtained from the different reference compounds are in excellent agreement. The presently recommended rate constant for HFC-134a [JPL 92-20, 1992, IUPAC, 1992] is too high by about 25%.

引用

页码：1359 / 1362

页数：4

共 11 条

[1] REACTION-KINETICS INVOLVING GROUND X2-PI AND EXCITED A2-XI+ HYDROXYL RADICALS .2. RATE CONSTANTS FOR REACTIONS OF OH X2-PI WITH HALOGENOMETHANES AND HALOGENOETHANES [J].