DICHLOROPHENYLUREA-INSENSITIVE REDUCTION OF SILICOMOLYBDIC ACID BY CHLOROPLAST PHOTOSYSTEM-II

被引:53
作者
BARR, R [1 ]
CRANE, FL [1 ]
GIAQUINTA, RT [1 ]
机构
[1] PURDUE UNIV,DEPT BIOL SCI,W LAFAYETTE,IN 47907
关键词
D O I
10.1104/pp.55.3.460
中图分类号
Q94 [植物学];
学科分类号
071001 ;
摘要
引用
收藏
页码:460 / 462
页数:3
相关论文
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