USE OF HAFNIUM DIOXIDE IN MULTILAYER DIELECTRIC REFLECTORS FOR NEAR UV

被引：61

作者：

BAUMEISTER, P ^{[1
]}

ARNON, O ^{[1
]}

机构：

[1] UNIV ROCHESTER,INST OPTICS,ROCHESTER,NY 14627

来源：

APPLIED OPTICS | 1977年 / 16卷 / 02期

关键词：

D O I：

10.1364/AO.16.000439

中图分类号：

O43 [光学];

学科分类号：

070207 [光学]; 0803 [光学工程];

摘要：

引用

页码：439 / 444

页数：6

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