EPITAXIALLY GROWN CUPRATE SUPERCONDUCTOR FILMS AND FURTHER ATTEMPTS AT THEIR DESIGN

被引：1

作者：

KAWAI, M

机构：

[1] Research Laboratory of Engineering Materials, Tokyo Institute of Technology, Midori-ku, Yokohama, 227

来源：

THERMOCHIMICA ACTA | 1991年 / 174卷

关键词：

D O I：

10.1016/0040-6031(91)80165-F

中图分类号：

O414.1 [热力学];

学科分类号：

摘要：

Epitaxially grown cuprate superconducting films are one of the most promising systems from the view-point of applications. The nature of the epitaxial growth of the film on the substrate surface, and heteroepitaxial thin film are discussed. Further artificial designing of the film by the layer-by-layer deposition method and a hint on designing a self-selective deposition system is discussed.

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页码：269 / 280

页数：12

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