HYDROGEN ABSORPTION IN PD COATED NB-FILM AND V-FILM

被引：4

作者：

AZOFEIFA, DE ^{[1
]}

CLARK, N ^{[1
]}

机构：

[1] UNIV COSTA RICA,ESCUELA FIS,SAN JOSE,COSTA RICA

来源：

ZEITSCHRIFT FUR PHYSIKALISCHE CHEMIE-INTERNATIONAL JOURNAL OF RESEARCH IN PHYSICAL CHEMISTRY & CHEMICAL PHYSICS | 1993年 / 181卷

关键词：

THIN FILMS; PD-COATED V AND NB; RESISTIVITY; HALL COEFFICIENT;

D O I：

10.1524/zpch.1993.181.Part_1_2.387

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Vanadium and niobium films (30 to 100 nm) are coated with a palladium thin film (less than 5 nm) and then submitted to several hydrogenation cycles. The films were evaporated by electron beam bombardment in high vacuum. The Pd coverage maintains the reactivity of the V and Nb films. The hydrogen pressure is varied from 0 to 50 Torr. Results are presented for the electrical resistance and the Hall coefficient as a function of hydrogen pressure. The V films show thickness dependence in their resistance change and a small decrease in the Hall coefficient.

引用

页码：387 / 391

页数：5

共 12 条

[1]

AZOFEIFA DE, 1989, Z PHYS CHEM NEUE FOL, V163, P621

[2]

AZOFEIFA DE, 1991, SURF SCI, P307

[3] KINETICS OF HYDROGEN INTERACTION WITH TIHX FILMS, 0 LESS-THAN-OR-EQUAL-TO X "LESS-THAN-OR-APPROXIMATELY-EQUAL-TO 2 [J].