ORIENTATION OF CACUO2 THIN-FILMS IN RF-SPUTTERING

被引：13

作者：

YAZAWA, I

TERADA, N

MATSUTANI, K

SUGISE, R

JO, M

IHARA, H

机构：

[1] TOPPAN PRINTING LTD, KITA KATSUSHIKA, SAITAMA 345, JAPAN

[2] TOKUYAMA SODA LTD, FUJISAWA, KANAGAWA 252, JAPAN

[3] UBE IND LTD, UBE, YAMAGUCHI 755, JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1990年 / 29卷 / 04期

关键词：

CaCuO[!sub]2[!/sub; Preferred orientation; Sputtering; Superconductor; Thin film;

D O I：

10.1143/JJAP.29.L566

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The orientation of CaCuO2films was examined under various RF sputtering conditions. Two types of crystal growth, (001) and (110) orientation, were controlled by varying the partial pressure of O2and Ar gas. (001) orientation was observed at lower gas pressure and (110) orientation was observed at higher gas pressure. This suggests that the orientation of CaCuO2film is related to the total pressure of the sputtering gas. © 1990 IOP Publishing Ltd.

引用

页码：L566 / L568

页数：3

共 4 条

[1] FORMATION OF SUPERCONDUCTING BI-SR-CA-CU-O THIN-FILMS WITH CONTROLLED C-AXIS LATTICE SPACINGS BY MULTITARGET SPUTTERING [J].

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JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1988, 27 (10) :L1883-L1886

[2]

Ihara H., 1989, Advances in Superconductivity. Proceedings of the 1st International Symposium on Superconductivity, P793

[3] A NEW HIGH-TC TLBA2CA3CU4O11 SUPERCONDUCTOR WITH TC-GREATER-THAN-120-K [J].

IHARA, H ;

SUGISE, R ;

HIRABAYASHI, M ;

TERADA, N ;

JO, M ;

HAYASHI, K ;

NEGISHI, A ;

TOKUMOTO, M ;

KIMURA, Y ;

SHIMOMURA, T .

NATURE, 1988, 334 (6182) :510-511

[4] ON THE 110-K SUPERCONDUCTOR IN THE BI-CA-SR-CU-O SYSTEM [J].

TAKAYAMAMUROMACHI, E ;

UCHIDA, Y ;

MATSUI, Y ;

ONODA, M ;

KATO, K .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1988, 27 (04) :L556-L558

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