PREPARATION OF YBCO THIN-FILMS BY MEANS OF A HOLLOW-CATHODE DISCHARGE SPUTTERING DEVICE

被引：6

作者：

LUDWIG, F ^{[1
]}

HINKEL, V ^{[1
]}

SCHURIG, T ^{[1
]}

MULLER, JP ^{[1
]}

STOSSLEIN, U ^{[1
]}

MULLER, HU ^{[1
]}

KOCH, H ^{[1
]}

机构：

[1] PHYS TECH BUNDESANSTALT,INST BERLIN,W-1000 BERLIN 10,GERMANY

来源：

PHYSICA C | 1991年 / 180卷 / 1-4期

关键词：

D O I：

10.1016/0921-4534(91)90642-C

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

YBaCuO thin films have been grown in-situ on (100) SrTiO3 from stoichiometric ceramic targets using a hollow cathode discharge sputtering device. The used linear hollow cathode sputter source can be advantageously up-scaled for uniform large area thin film deposition. Thin YBaCuO films have been produced with T(c) almost-equal-to 90K, j(c)(77K) almost-equal-to 10(6) A/cm2 and rho(100K) < 0.1m-OMEGA-cm. It is shown that a substrate movement transversely to the hollow cathode slot during the deposition guarantees both high film thickness homogenity and no degradation of the superconducting properties.

引用

页码：85 / 89

页数：5