TEMPERATURE-DEPENDENCE OF NUCLEATION DENSITY OF CHEMICAL VAPOR-DEPOSITION DIAMOND

被引：29

作者：

HAYASHI, Y ^{[1
]}

DRAWL, W ^{[1
]}

MESSIER, R ^{[1
]}

机构：

[1] PENN STATE UNIV,MAT RES LAB,UNIV PK,PA 16802

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1992年 / 31卷 / 2B期

关键词：

CVD DIAMOND; NUCLEATION DENSITY; HYDROGEN DESORPTION; ADSORPTION; PRECURSOR; ELLIPSOMETRY;

D O I：

10.1143/JJAP.31.L193

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The temperature dependence of the nucleation density of Chemical Vapor Deposition diamond was carefully investigated by ellipsometric monitoring. Substrates were pre-treated by rubbing with diamond powder and then by wiping off the residual powder until visually clean. Nucleation density was greater than 10(10)/cm2 in some ranges of temperature. It was also observed that nucleation density increased suddenly to 860-degrees-C and then gradually decreased in the range of higher temperatures. The results were explained by a change in the adsorption state of the precursor, from a physical to a chemical.

引用

页码：L193 / L196

页数：4

共 12 条

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