BEAM-INDUCED BROADENING EFFECTS IN SPUTTER DEPTH PROFILING

被引：168

作者：

WITTMAACK, K

机构：

来源：

关键词：

D O I：

10.1016/0042-207X(84)90115-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：119 / 137

页数：19

共 122 条

COBURN, JW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (05) :1037-1044

[22]

ERLEWEIN J, 1980, THIN SOLID FILMS, V69, pL39

ETZKORN, HW ;

KIRSCHNER, J .

NUCLEAR INSTRUMENTS & METHODS, 1980, 168 (1-3) :395-398

[24]

ETZKORN HW, 1980, S SPUTTERING, P542

[25] DEPTH OF ORIGIN OF SPUTTERED ATOMS [J].

FALCONE, G ;

SIGMUND, P .

APPLIED PHYSICS, 1981, 25 (03) :307-310

[26]

GIBBONS JF, 1975, PROJECTED RANGE STAT

GRASMARTI, A ;

SIGMUND, P .

NUCLEAR INSTRUMENTS & METHODS, 1981, 180 (01) :211-219

[28]

GSCHNEIDNER KA, 1964, SOLID STATE PHYS, V16, P275

[29] ION-BEAM-INDUCED ATOMIC MIXING [J].

HAFF, PK ;

SWITKOWSKI, ZE .

[30]

HARMS H, COMMUNICATION