GROWTH MODE DETERMINATIONS FOR THE EPITAXIAL CU/PD(111)/MICA AND PD/CU(111)/MICA THIN-FILM SYSTEMS

被引:7
作者
ORAL, B
VOOK, RW
机构
[1] Laboratory for Solid State Science and Technology, Physics Department, Syracuse, New York
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1990年 / 8卷 / 03期
关键词
D O I
10.1116/1.576628
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The growth of Cu on epitaxiaily grown Pd( 111)/mica and the growth of Pd on epitaxially grown Cu( 111 )/mica surfaces were studied with Auger electron spectroscopy (AES) and low-energy electron diffraction (LEED) under UHV conditions. The results show that epitaxial Cu grows on Pd (111) by a layer mode of growth. However, Pd grows on Cu (111) in three-dimensional clusters on top of an initial approximately three monolayers, i.e., by a Stranski-Krastanov mode. LEED studies showed that in both cases a (1 × 1) pattern was observed with increasing overlayer thicknesses. © 1990, American Vacuum Society. All rights reserved.
引用
收藏
页码:3048 / 3051
页数:4
相关论文
共 14 条