SURFACE CHEMICAL BONDING OF (NH4)2SX-TREATED INP(001)

被引：39

作者：

MAEDA, F

WATANABE, Y

OSHIMA, M

机构：

[1] NTT Interdisciplinary Research Laboratories, Midoricho, Musashino

来源：

APPLIED PHYSICS LETTERS | 1993年 / 62卷 / 03期

关键词：

D O I：

10.1063/1.108996

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

(NH4)2Sx-treated InP(001) surface, were analyzed by using synchrotron radiation photoelectron spectroscopy to characterize the S-passivated surfaces and elucidate the solution etching mechanism. Polysulfide chemical states were observed for the first time in both the P 2p and In 4d spectra. Monosulfide and polysulfide states were also evident in the S 2p spectra. Etching models consistent with the experimental results were discussed.

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页码：297 / 299

页数：3

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