IONIC POLISHING OF OPTICAL SURFACES

被引：10

作者：

SCHROEDER, JB

BASHKIN, S

NESTER, JF

机构：

来源：

APPLIED OPTICS | 1966年 / 5卷 / 06期

关键词：

D O I：

10.1364/AO.5.001031

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：1031 / +

页数：1

共 18 条

[1]

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HINES, RL ;

WALLOR, R .

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[3] RADIATION EFFECTS OF BOMBARDMENT OF QUARTZ AND VITREOUS SILICA BY 7.5-KEV TO 59-KEV POSITIVE IONS [J].

HINES, RL ;

ARNDT, R .

PHYSICAL REVIEW, 1960, 119 (02) :623-633

[4] RADIATION EFFECT OF POSITIVE ION BOMBARDMENT ON GLASS [J].

HINES, RL .

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[5] IONIC BOMBARDMENT CLEANING OF GLASS [J].

HOLLAND, L .

NATURE, 1958, 181 (4621) :1451-1452

[6]

Holland L., 1964, PROPERTIES GLASS SUR

[7] SPUTTERING STUDIES OF INSULATORS BY MEANS OF LANGMUIR PROBES [J].

JORGENSO.GV ;

WEHNER, GK .

JOURNAL OF APPLIED PHYSICS, 1965, 36 (09) :2672-&

[8] REDUCTION OF OPTICAL REFLECTIVITY OF GLASS SURFACES RESULTING FROM ION BOMBARDMENT [J].

KOCH, J .

NATURE, 1949, 164 (4157) :19-20

[9]

KOEDAM M, 1961, PHILIPS RES REP, V16, P101

[10]

MCCARTNEY JT, 1959, 3 P C CARB, P223

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