HIGH-TEMPERATURE STRENGTH STABILITY OF 3 FORMS OF CHEMICALLY VAPOR-DEPOSITED TUNGSTEN

被引：7

作者：

BRYANT, WA ^{[1
]}

机构：

[1] WESTINGHOUSE ASTRONUCL LAB,PITTSBURGH,PA 15236

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1974年 / 11卷 / 04期

关键词：

D O I：

10.1116/1.1312737

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：695 / 699

页数：5

共 13 条

[1] BRYANT WA, 1972, NASACR120876 REP
[2] CHEMICAL VAPOR DEPOSITED TUNGSTEN - MECHANICAL EVALUATION AT HIGH TEMPERATURES
CHUN, JS
NICHOLSON, PS
SOSIN, A
BYRNE, JG
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (09) : 1492 - +
[3] CHUN JS, 1972, 3RD P INT C CHEM VAP, P694
[4] Festa J., 1967, P C CVD GATLINBURG, P349
[5] GYFTOPOULOS EP, 1969, TE4092310869 REP
[6] HOLZL RA, 1971, Patent No. 3565676
[7] Honeycombe R.W.K., 1968, PLASTIC DEFORMATION
[8] MCLEAN D, 1962, MECHANICAL PROPERTIE
[9] GAS BUBBLES IN THERMOCHEMICALLY DEPOSITED TUNGSTEN
SCHAFFHAUSER, AC
FARRELL, K
[J]. JOURNAL OF NUCLEAR MATERIALS, 1967, 22 (01) : 106 - +
[10] SCHAFFHAUSER AC, 1965, ORNLP1506 REP