PHASE-STABILITY OF ION IRRADIATED NI2AL3

被引：8

作者：

NASTASI, M

机构：

[1] Los Alamos National Laboratory, Materials Science and Technology Division, Los Alamos

来源：

JOURNAL OF THE LESS-COMMON METALS | 1991年 / 168卷 / 01期

关键词：

D O I：

10.1016/0022-5088(91)90037-5

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The low-temperature phase stability of thin film Ni2Al3 under 400 keV Kr+ ion irradiation was examined in the Argonne National Laboratory high-voltage electron microscope. At 20 K the disordering transformation from D5(13)-Ni2Al3-to-B2(CsCl)-to-A2(b.c.c.) was observed during an exposure to 7.5 X 10(13) Kr cm-2. A combination of amorphous and b.c.c. phases was observed at 1.5 x 10(14) Kr cm-2 with complete amorphization occurring after 3 x 10(14) Kr cm-2. This transformation sequence is supported by an analysis of quasi-chemical and CALPHAD-type thermodynamic data. The observations and analysis indicate that the free energy of the amorphous state is higher than the free energy of the disordered state and that additional forms of radiation damage besides chemical disordering are required for the amorphization of Ni2Al3.

引用

页码：91 / 102

页数：12

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