MAGNETIC AND STRUCTURAL CHARACTERIZATION OF SPUTTERED FEN MULTILAYER FILMS

The magnetic and structural properties of ferromagnetic FeN thin films, FeN/FeN (ferromagnetic/paramagnetic) and FeN/SiO2 multilayers deposited in a rotational dc magnetron sputter system were investigated. Monolithic films containing congruent-to 2at% N2 had 4-pi-M(s), values congruent-to 25 kG. Saturation magnetostriction (lambda(s)) has been related to N2 content and film thickness. Lambda(s) could be varied significantly over a range of compositions where 4-pi-M(s) was > 22 kG by adjusting thickness and nitrogen content. Lamination reduced easy- and hard-axis coercivity to < 1 Oe. Lorentz microscopy indicated that the ferromagnetic FeN layers in the FeN/FeN films were exchanged coupled while those in the FeN/SiO2 films were magnetostatically coupled.