OXYGEN ADSORPTION ON SILICON SURFACES OBSERVED VIA ELECTRON SPIN RESONANCE

被引：38

作者：

MULLER, KA

SPARNAAY, MJ

CHAN, P

KLEINER, R

OVENALL, DW

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1964年 / 35卷 / 07期

关键词：

D O I：

10.1063/1.1702827

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：2254 / &

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