GLOW-DISCHARGE DEPOSITION OF TETRAMETHYLSILANE FILMS

被引：48

作者：

CATHERINE, Y

ZAMOUCHE, A

机构：

来源：

PLASMA CHEMISTRY AND PLASMA PROCESSING | 1985年 / 5卷 / 04期

关键词：

D O I：

10.1007/BF00566009

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

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页码：353 / 368

页数：16

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共 30 条

[1] REACTIVE PLASMA DEPOSITED SIXCYHZ FILMS
CATHERINE, Y
TURBAN, G
[J]. THIN SOLID FILMS, 1979, 60 (02) : 193 - 200
[2] CATHERINE Y, 1983, 9TH INT VAC C MADR
[3] CHEN KS, 1981, KOBUNSHI RONBUNSHU, V38, P665
[4] CLIFFORD RP, 1972, J ORGANOMET CHEM, V39, P53
[5] NEUTRAL-FRAGMENT MASS-SPECTRA OF THE TETRAMETHYL COMPOUNDS OF THE GROUP-IVA ELEMENTS
FLESCH, GD
SVEC, HJ
[J]. INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES, 1981, 38 (2-3): : 361 - 370
[6] GAMMIE L, 1979, J PHYS CHEM, V83, P24
[7] ELECTRON IMPACT SPECTROSCOPY OF TETRAMETHYLSILICON, -TIN AND -LEAD
HOBROCK, BG
KISER, RW
[J]. JOURNAL OF PHYSICAL CHEMISTRY, 1961, 65 (12) : 2186 - &
[8] COMPARISONS OF GLOW-DISCHARGE POLYMERIZATIONS AMONG TETRAMETHYLSILANE, DIMETHYLDIMETHOXYSILANE, AND TETRAMETHOXYSILANE
INAGAKI, N
KOYAMA, M
[J]. JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, 1983, 21 (01) : 183 - 190
[9] GLOW-DISCHARGE POLYMERIZATION OF TRIMETHYLVINYLSILANE AND TETRAMETHYLSILANE
INAGAKI, N
TAKI, M
[J]. JOURNAL OF APPLIED POLYMER SCIENCE, 1982, 27 (11) : 4337 - 4343
[10] CHEMICAL IONIZATION MASS-SPECTROMETRY OF SILANE, DISILANE AND METHYLSILANES
KRAUSE, JR
POTZINGER, P
[J]. INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES, 1975, 18 (04): : 303 - 316