VAPOR-PRESSURES AND GAS-PHASE (P, RHO(N), T) VALUES FOR CF3CHF2 (R125)

被引:40
作者
BOYES, SJ
WEBER, LA
机构
[1] Thermophysics Division, Chemical Science and Technology Laboratory, National Institute of Standards and Technology, Gaithersburg
关键词
D O I
10.1006/jcht.1995.0013
中图分类号
O414.1 [热力学];
学科分类号
摘要
We present new vapour pressures and the (p, rho(n), T) surface of CF3CHF2 (pentafluoroethane, designated R125 by the refrigeration industry) in the temperature range T = 273 K to 363 K. The (p, rho(n), T) measurements are for the gas phase at densities up to approximately the critical density. The static vapour pressures reported here have been combined with previous ebulliometric measurements made in this laboratory at lower temperatures. Correlating equations are given for the vapour pressures from T = 220 K to the critical temperature: T-c = 339.30 K. A virial equation has been used to correlate the (p, rho(n), T) surface at amount-of-substance densities up to 1600 mol.m(-3). Second and third virial coefficients have been derived from the (p, rho(n), T) measurements.
引用
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页码:163 / 174
页数:12
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