A LOW-Z C+SIC ALLOY COATING MATERIAL FOR PLASMA INTERFACE APPLICATIONS

被引：13

作者：

HOPKINS, GR

TRESTER, PW

KAAE, JL

机构：

[1] GA Technologies Inc, San Diego, CA,, USA, GA Technologies Inc, San Diego, CA, USA

来源：

JOURNAL OF NUCLEAR MATERIALS | 1984年 / 128卷 / DEC期

关键词：

METALS AND ALLOYS - Plating - SPUTTERING;

D O I：

10.1016/0022-3115(84)90461-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A new C plus SiC alloy material has been developed for fusion in-vessel components. Limiter/armor tiles coated with this material have been tested for over 16,000 plasma shots during routine operation of Doublet III. The performance has been excellent. Simulation tests have shown this C plus SiC alloy to be highly resistant to chemical sputtering below 1000 degree C and to be resistant to damage from thermal shocks. The low Z characteristic is advantageous in reducing plasma energy loss from impurities.

引用

页码：802 / 811

页数：10

共 10 条

[1] HEAT-FLUX TO THE LIMITER DURING DISRUPTIONS AND NEUTRAL BEAM INJECTION IN DOUBLET-III
HINO, T
DEGRASSIE, J
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MEYER, C
PETRIE, TW
KAHN, C
EJIMA, S
[J]. JOURNAL OF NUCLEAR MATERIALS, 1984, 121 : 337 - 343
[2] SURFACE MICROANALYSIS OF C+SIC COATING ON LIMITER ARMOR EXPOSED IN DOUBLET-III
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MOHRI, M
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[J]. JOURNAL OF NUCLEAR MATERIALS, 1984, 128 (DEC) : 477 - 480
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[4] HOPKINS GR, 1982, B AM PHYS SOC, V27
[5] HOPKINS GR, 1980, 4TH P TOP M TECHN CO, P583
[6] KAAE JL, 1983, 16TH BIENN C CARB SA
[7] ROTH JR, COMMUNICATION
[8] SCHWARTZSCHILD BM, 1981, PHYS TODAY, V34, P21
[9] PERFORMANCE RESULTS ON A C-SIC ALLOY COATING CHEMICALLY VAPOR-DEPOSITED ONTO GRAPHITE SUBSTRATES
TRESTER, PW
HOPKINS, GR
KAAE, JL
WHITLEY, J
[J]. THIN SOLID FILMS, 1983, 108 (04) : 383 - 393
[10] TRESTER PW, 1984, J NUCL MATER, V122, P1298

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