REACTIONS OF CHEMICALLY ADSORBED MONOLAYERS INDUCED BY ELECTRON-BEAM IRRADIATION IN ACTIVE GAS ATMOSPHERE AND APPLICATIONS FOR THE PREPARATION OF MULTILAYERS

Multilayers of ω-nonadecenyltrichlorosilane (V-NTS) have been prepared on SiO2/Si substrates by repeated cycles of chemical adsorption (CA) in a nonaqueous solvent containing V-NTS and electron beam (EB) irradiation in an active gas atmosphere. The molecular density or the molecular arrangement in the multilayers was controlled by the preparation conditions such as the EB irradiation dose, the temperature during the CA process, the CA process time, or the concentration of V-NTS in the solution. The thickness of the multilayers was increased by a predetermined amount at every CA process. With this method, multilayers of high molecular density can be obtained easily. The terminal vinyl group was important for the preparation of multilayers using this method, since it was converted to hydroxyl, aldehyde, and/or carboxyl groups by irradiation in an oxygen atmosphere and to imino and/ or amino groups by irradiation in a nitrogen atmosphere. These groups combine chemically with the chlorosilane group of the incoming monomer in order to build up the next layer by the subsequent CA process. © 1990 American Chemical Society.