LOCAL HYDRIDE FORMATION OF THE SI(111)-(7X7) SURFACE BY HYDROGEN-ATOMS DEPOSITED FROM A SCANNING TUNNELING MICROSCOPE TIP

被引：47

作者：

KURAMOCHI, H ^{[1
]}

UCHIDA, H ^{[1
]}

AONO, M ^{[1
]}

机构：

[1] INST PHYS & CHEM RES, WAKO, SAITAMA 351, JAPAN

来源：

PHYSICAL REVIEW LETTERS | 1994年 / 72卷 / 06期

关键词：

D O I：

10.1103/PhysRevLett.72.932

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The Si (111)-(7 x 7) surface can be locally hydrized at the nanometer scale by depositing H atoms from the tip of a scanning tunneling microscope. The H atoms to be deposited are continuously supplied to the tip made of Pt (20% Ir) from an ambient H-2 molecule las through dissociative adsorption (H-2 --> 2H) and are deposited onto the Si(111)-(7 x 7) sample surface one by one by field evaporation; although the ambient H-2 molecules are not adsorbed on the Si (111)-(7 x 7) surface, the H atoms from the tip are adsorbed on the surface.

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页码：932 / 935

页数：4

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