REACTIVE TIN DEPOSITION ON ALLOYS WITH LASER-RADIATION

被引：7

作者：

KREUTZ, EW ^{[1
]}

KROSCHE, M ^{[1
]}

SUNG, H ^{[1
]}

VOSS, A ^{[1
]}

WISSENBACH, K ^{[1
]}

机构：

[1] FRAUNHOFER INST LASERTECH,W-5100 AACHEN,GERMANY

来源：

APPLIED SURFACE SCIENCE | 1992年 / 54卷

关键词：

D O I：

10.1016/0169-4332(92)90020-X

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The formation of TiN layers on metallic substrates is investigated as a function of processing variables. Thin TiN films are generated by laser-assisted physical vapor deposition by evaporation of Ti targets with CO2 laser radiation under N2 processing gas and subsequent deposition on stainless steel substrates. Thick TiN layers are formed on substrates of Ti-based alloys by gaseous surface alloying with laser radiation in N2 atmosphere. The processing variables are varied to relate the processing conditions to film dimensions and resultant metallurgical and mechanical properties during laser-assisted physical vapor deposition or to relate processing conditions to dimensions and solute content of the alloyed zone and resultant metallurgical and mechanical properties in gaseous alloying with laser radiation. The structural and mechanical properties of the deposited films are investigated by optical microscopy, SEM, X-ray diffraction, metallographic investigations and hardness measurements.

引用

页码：69 / 74

页数：6

共 11 条

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