PHOTOCHEMICAL MIGRATORY APTITUDES IN CYCLOHEXENONES . MECHANISTIC AND EXPLORATORY PHOTOCHEMISTRY .23.

被引：104

作者：

ZIMMERMAN, HE

RIEKE, RD

SCHEFFER, JR

机构：

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 1967年 / 89卷 / 09期

关键词：

D O I：

10.1021/ja00985a012

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

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页码：2033 / +

页数：1

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