NONDESTRUCTIVE DETERMINATION OF THICKNESS AND PERFECTION OF SILICA FILMS

被引：6

作者：

MURRAY, LA

GOLDSMITH, N

机构：

来源：

关键词：

D O I：

10.1149/1.2423809

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1297 / +

页数：1

共 7 条

[1] BORN M, 1959, PRINCIPLES OPTICS, P624
[2] THICKNESS MEASUREMENT OF SILICON DIOXIDE LAYERS BY ULTRAVIOLET-VISIBLE INTERFERENCE METHOD
CORL, EA
WIMPFHEIMER, H
[J]. SOLID-STATE ELECTRONICS, 1964, 7 (10) : 755 - &
[3] MURRAY L, SUBMITTED FOR PUBLIC
[4] MURRAY L, 1965, MAY B AM PHYS SOC
[5] NEUROTH N, 1955, GLASTECH BER, V11, P420
[6] PLISKIN W, 1964, MAY TOR M SOC
[7] STUDY OF THE STRUCTURE OF QUARTZ, CRISTOBALITE, AND VITREOUS SILICA BY REFLECTION IN INFRARED
SIMON, I
MCMAHON, HO
[J]. JOURNAL OF CHEMICAL PHYSICS, 1953, 21 (01) : 23 - 30