PREVAIL - AN E-BEAM STEPPER WITH VARIABLE AXIS IMMERSION LENSES

被引：50

作者：

PFEIFFER, HC

STICKEL, W

机构：

来源：

MICROELECTRONIC ENGINEERING | 1995年 / 27卷 / 1-4期

关键词：

D O I：

10.1016/0167-9317(94)00075-6

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Project PREVAIL (Projection Exposure with Variable Axis Immersion Lenses) has been initiated to develop an e-beam alternative to ''sub-optical'' lithography (less-than-or-equal-to 0.13 mum) providing superior resolution and pattern placement accuracy at competitive throughput.

引用

页码：143 / 146

页数：4

共 9 条

[1]

Berger, Gibson, Camarda, Farrow, Huggins, Kraus, Liddle, Projection electron-beam lithography: A new approach, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 9 B, 6, (1991)

[2]

Pfeiffer, Davis, Enichen, Gordon, Groves, Hartley, Quickle, Rockrohr, Stickel, Weber, EL-4, a new generation electron-beam lithography system, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 11 B, 6, (1993)

[3]

Heritage, J. Vac. Sci. Technol., 12, 6, (1975)

[4]

Lischke, Anger, Muenchmeyer, Oelmann, Frosien, Schmitt, Sturm, El. & Ion Beam Sci. & Technol., (1978)

[5]

Lischke, Anger, Muenchmeyer, Oelmann, Frosien, Schmitt, Sturm, Optik, 54, (1979)

[6]

Koops, Grob, Submicron Lithography by Demagnifying Electron-Beam Projection, Springer Series in Optical Sciences, 43, (1984)

[7]

Koops, Microelectronic Eng., 9, (1989)

[8]

Pfeiffer, Langner, Optik, 92, (1992)

[9]

Kendall, Doran, Weissmann, A servo guided X–Y–theta stage for electron beam lithography, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 9 B, 6, (1991)

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