STUDY OF EQUIPOTENTIAL LINES NEAR SAMPLING ORIFICE FOR CONTINUUM PLASMAS

被引：1

作者：

CHANG, JS ^{[1
]}

MATSUMURA, S ^{[1
]}

CHEN, SL ^{[1
]}

机构：

[1] MUSASHI INST TECHNOL,DEPT ELECT ENGN,SETAGAYA,TOKYO,JAPAN

来源：

JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS | 1976年 / 9卷 / 10期

关键词：

D O I：

10.1088/0022-3735/9/10/031

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：894 / 895

页数：2

共 5 条

[1] ION SAMPLING CONSIDERATIONS FOR A DISCHARGE PLASMA OF NITROGEN [J].

BOHME, DK ;

GOODINGS, JM .

CHANG, JS .

INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES, 1975, 16 (04) :448-450

[3]

DRAWIN HW, 1968, PLASMA DIAGNOSTICS, P777

[4] MASS-SPECTROMETRIC MONITORING OF IONS IN PLASMAS AND SWARMS [J].

HASTED, JB .

INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES, 1975, 16 (1-2) :3-14

[5] Flow of ions through a small orifice in a charged plate [J].

Tonks, L ;

Smith, HMM ;

Langmuir, I .

PHYSICAL REVIEW, 1926, 28 (01) :104-128