IMPROVED PERFORMANCE OF INSE-BASED PHOTOELECTROCHEMICAL CELLS BY MEANS OF A SELECTIVE (PHOTO)ELECTROCHEMICAL ETCHING

被引：34

作者：

TENNE, R ^{[1
]}

THEYS, B ^{[1
]}

RIOUX, J ^{[1
]}

LEVYCLEMENT, C ^{[1
]}

机构：

[1] CNRS,PHYS SOLIDE LAB,1 PLACE ARISTIDE BRIAND,F-92190 MEUDON,FRANCE

来源：

JOURNAL OF APPLIED PHYSICS | 1985年 / 57卷 / 01期

关键词：

D O I：

10.1063/1.335377

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：141 / 145

页数：5

共 31 条

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