PROPERTIES OF SPUTTERED HIGH TC THIN-FILMS

被引：8

作者：

GAVALER, JR ^{[1
]}

机构：

[1] WESTINGHOUSE ELECT CORP, RES LABS, PITTSBURGH, PA 15235 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1975年 / 12卷 / 01期

关键词：

D O I：

10.1116/1.568733

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：103 / 106

页数：4

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