DEFECT FORMATION IN LIF BY LOW-ENERGY ION-IMPLANTATION

被引:9
作者
AFONSO, CN [1 ]
ORTIZ, C [1 ]
CLARK, GJ [1 ]
机构
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
来源
PHYSICA STATUS SOLIDI B-BASIC RESEARCH | 1985年 / 131卷 / 01期
关键词
D O I
10.1002/pssb.2221310107
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
引用
收藏
页码:87 / 96
页数:10
相关论文
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