UNDULATOR RADIATION FOR AT-WAVELENGTH INTERFEROMETRY OF OPTICS FOR EXTREME-ULTRAVIOLET LITHOGRAPHY

被引：38

作者：

ATTWOOD, D ^{[1
]}

SOMMARGREN, G ^{[1
]}

BEGUIRISTAIN, R ^{[1
]}

NGUYEN, K ^{[1
]}

BOKOR, J ^{[1
]}

CEGLIO, N ^{[1
]}

JACKSON, K ^{[1
]}

KOIKE, M ^{[1
]}

UNDERWOOD, J ^{[1
]}

机构：

[1] LAWRENCE BERKELEY LAB, CTR X RAY OPT, BERKELEY, CA 94720 USA

来源：

APPLIED OPTICS | 1993年 / 32卷 / 34期

关键词：

D O I：

10.1364/AO.32.007022

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Techniques are described for at-wavelength interferometry of multilayer coated optics designed for use in extreme-ultraviolet lithography. Broadly tunable undulator radiation, which covers the spectral region from 45 to 400 angstrom, is described. The coherent power available at these wavelengths is described, and several types of interferometer that might be suitable at these short wavelengths are also described.

引用

页码：7022 / 7031

页数：10

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