ELECTRICAL STUDY OF THIN SIO2 LAYERS OBTAINED BY ANODIC-OXIDATION OF P-TYPE SILICON IN PURE WATER USING I-U, C-U, AND G-U MEASUREMENTS

被引:5
作者
MORFOULI, P
PANANAKAKIS, G
机构
来源
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 1989年 / 111卷 / 02期
关键词
D O I
10.1002/pssa.2211110218
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
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页码:529 / 539
页数:11
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共 20 条
[1]   SURFACE STATES AT STEAM-GROWN SILICON-SILICON DIOXIDE INTERFACES [J].
BERGLUND, CN .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1966, ED13 (10) :701-+
[2]  
BEYON JDE, 1973, SOLID STATE ELECTRON, V16, P309
[3]   DESCRIPTION OF SIO2-SI INTERFACE PROPERTIES BY MEANS OF VERY LOW FREQUENCY MOS CAPACITANCE MEASUREMENTS [J].
CASTAGNE, R ;
VAPAILLE, A .
SURFACE SCIENCE, 1971, 28 (01) :157-+
[4]  
CASTAGNE R, 1970, CR ACAD SCI B PHYS, V270, P1347
[5]   LOW-PRESSURE OXIDATION OF SILICON STIMULATED BY LOW-ENERGY ELECTRON-BOMBARDMENT [J].
COLLOT, P ;
GAUTHERIN, G ;
AGIUS, B ;
RIGO, S ;
ROCHET, F .
PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 1985, 52 (06) :1051-1069
[6]  
DiMaria D.J., 1978, PHYS SIO2 ITS INTERF, P160, DOI [10.1016/B978-0-08-023049-8.50034-8, DOI 10.1016/B978-0-08-023049-8.50034-8]
[7]   HIGH-FIELD PHENOMENA IN THIN PLASMA NITRIDED SIO2-FILMS [J].
ELSAYED, M ;
DACOSTA, JC .
APPLIED SURFACE SCIENCE, 1987, 30 (1-4) :229-236
[8]   COMPLETE EXPLORATION OF THE SILICON GAP AT THE SI-SIO2 INTERFACE OF MIS TUNNEL-DIODES USING THE CONDUCTANCE TECHNIQUE AT VARIOUS TEMPERATURES AND ILLUMINATION LEVELS [J].
ELSAYED, M ;
PANANAKAKIS, G ;
KAMARINOS, G .
SOLID-STATE ELECTRONICS, 1985, 28 (04) :345-357
[9]   DEGRADATION OF THE ELECTRICAL CHARACTERISTICS OF THE SI-SIO2 INTERFACE INDUCED BY ELECTRON INJECTION [J].
FALCONY, C ;
SALAS, FH .
JOURNAL OF APPLIED PHYSICS, 1986, 59 (11) :3787-3791
[10]   THE EFFECT OF GATE METAL AND SIO2 THICKNESS ON THE GENERATION OF DONOR STATES AT THE SI-SIO2 INTERFACE [J].
FISCHETTI, MV ;
WEINBERG, ZA ;
CALISE, JA .
JOURNAL OF APPLIED PHYSICS, 1985, 57 (02) :418-425