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AN OXYGEN-SENSITIVE ELECTRODE IMPEDANCE IN SR-DOPED LACRO3
被引:2
作者
:
BETHIN, J
论文数:
0
引用数:
0
h-index:
0
机构:
NBS,WASHINGTON,DC 20234
BETHIN, J
CHIANG, CK
论文数:
0
引用数:
0
h-index:
0
机构:
NBS,WASHINGTON,DC 20234
CHIANG, CK
FRANKLIN, AD
论文数:
0
引用数:
0
h-index:
0
机构:
NBS,WASHINGTON,DC 20234
FRANKLIN, AD
SNELLGROVE, RA
论文数:
0
引用数:
0
h-index:
0
机构:
NBS,WASHINGTON,DC 20234
SNELLGROVE, RA
机构
:
[1]
NBS,WASHINGTON,DC 20234
[2]
GEN REFRACTORIES CO,BALACYNWYD,PA 19004
来源
:
JOURNAL OF APPLIED PHYSICS
|
1981年
/ 52卷
/ 06期
关键词
:
D O I
:
10.1063/1.329219
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:4115 / 4117
页数:3
相关论文
共 3 条
[1]
Dispersion and absorption in dielectrics I. Alternating current characteristics
Cole, KS
论文数:
0
引用数:
0
h-index:
0
机构:
Columbia Univ, Dept Physiol, New York, NY USA
Cole, KS
Cole, RH
论文数:
0
引用数:
0
h-index:
0
机构:
Columbia Univ, Dept Physiol, New York, NY USA
Cole, RH
[J].
JOURNAL OF CHEMICAL PHYSICS,
1941,
9
(04)
: 341
-
351
[2]
LOCALIZED LEVEL HOPPING TRANSPORT IN LA(SR)CRO3
KARIM, DP
论文数:
0
引用数:
0
h-index:
0
机构:
Argonne National Laboratory, Argonne
KARIM, DP
ALDRED, AT
论文数:
0
引用数:
0
h-index:
0
机构:
Argonne National Laboratory, Argonne
ALDRED, AT
[J].
PHYSICAL REVIEW B,
1979,
20
(06):
: 2255
-
2263
[3]
RHODERICK EH, 1979, METAL SEMICONDUCTOR
←
1
→
共 3 条
[1]
Dispersion and absorption in dielectrics I. Alternating current characteristics
Cole, KS
论文数:
0
引用数:
0
h-index:
0
机构:
Columbia Univ, Dept Physiol, New York, NY USA
Cole, KS
Cole, RH
论文数:
0
引用数:
0
h-index:
0
机构:
Columbia Univ, Dept Physiol, New York, NY USA
Cole, RH
[J].
JOURNAL OF CHEMICAL PHYSICS,
1941,
9
(04)
: 341
-
351
[2]
LOCALIZED LEVEL HOPPING TRANSPORT IN LA(SR)CRO3
KARIM, DP
论文数:
0
引用数:
0
h-index:
0
机构:
Argonne National Laboratory, Argonne
KARIM, DP
ALDRED, AT
论文数:
0
引用数:
0
h-index:
0
机构:
Argonne National Laboratory, Argonne
ALDRED, AT
[J].
PHYSICAL REVIEW B,
1979,
20
(06):
: 2255
-
2263
[3]
RHODERICK EH, 1979, METAL SEMICONDUCTOR
←
1
→