E(-)-BEAM DEPOSITION OF IN2O3 STABILIZED ZRO2 FILMS

被引：11

作者：

QADRI, SB

SKELTON, EF

HARFORD, MZ

JONES, R

LUBITZ, P

机构：

[1] Naval Research Laboratory, Washington

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1991年 / 9卷 / 03期

关键词：

D O I：

10.1116/1.577398

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Films of ZrO2-In2O3 were deposited by coevaporating ZrO2 and In2O3 using electron beam deposition techniques. During the deposition, the substrate was heated to 300-degrees-C. Postdeposition x-ray diffraction analyses showed that as-deposited films containing an In2O3 mole fraction ranging between 3.5 and 11.0 were crystalline with the zirconia in the cubic phase.

引用

页码：510 / 511

页数：2

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