PHOTOSENSITIVITY IN PHOSPHORUS-DOPED SILICA GLASS AND OPTICAL WAVE-GUIDES

被引：53

作者：

MALO, B ^{[1
]}

ALBERT, J ^{[1
]}

BILODEAU, F ^{[1
]}

KITAGAWA, T ^{[1
]}

JOHNSON, DC ^{[1
]}

HILL, KO ^{[1
]}

HATTORI, K ^{[1
]}

HIBINO, Y ^{[1
]}

GUJRATHI, S ^{[1
]}

机构：

[1] UNIV MONTREAL,DEPT PHYS,RECH PHYS & TECHNOL COUCHES MINCES GRP,MONTREAL H3C 3J7,QUEBEC,CANADA

来源：

APPLIED PHYSICS LETTERS | 1994年 / 65卷 / 04期

关键词：

D O I：

10.1063/1.112312

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Irradiation of hydrogen loaded or flame brushed phosphorus doped, germanium free silica glass with a 193-nm ArF excimer laser changes the optical absorption at ultraviolet wavelengths by 40-140 dB/mm and the refractive index by more than 2 x 10(-4). Bragg gratings with 90%-95% reflectivity are photoinduced in channel optical waveguides made from this glass. The thermal stability of the photosensitivity is measured by annealing up to 700-degrees-C.

引用

页码：394 / 396

页数：3

共 22 条

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