FERROELECTRIC MICROREGIONS AND RAMAN-SCATTERING IN KTAO3

被引：200

作者：

UWE, H ^{[1
]}

LYONS, KB ^{[1
]}

CARTER, HL ^{[1
]}

FLEURY, PA ^{[1
]}

机构：

[1] AT&T BELL LABS,MURRAY HILL,NJ 07974

来源：

PHYSICAL REVIEW B | 1986年 / 33卷 / 09期

关键词：

D O I：

10.1103/PhysRevB.33.6436

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：6436 / 6440

页数：5

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