CORRELATION OF ANISOTROPIC ETCHING OF SINGLE-CRYSTAL SILICON SPHERES AND WAFERS

被引：50

作者：

WEIRAUCH, DF ^{[1
]}

机构：

[1] TEXAS INSTR INC,DALLAS,TX 75222

来源：

关键词：

D O I：

10.1063/1.321787

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1478 / 1483

页数：6

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