EFFECT OF ALLOY COMPOSITION IN LIQUID AUSI ION-SOURCE

被引：7

作者：

KOMURO, M

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1986年 / 25卷 / 10期

关键词：

D O I：

10.1143/JJAP.25.1500

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1500 / 1503

页数：4

共 6 条

[1]

ARITOME H, 1984, JPN J APPL PHYS, V23, pL165

[2]

Komuro M., 1983, Proceedings of the International Ion Engineering Congress. The 7th Symposium (1983 International) on Ion Sources and Ion Assisted Technology (ISIAT '83) and the 4th International Conference on Ion and Plasma Assisted Techniques (IPAT '83), P337

[3] COMPUTER CONTROL OF MASKLESS ION IMPLANTER WITH AU-SI-BE LM ION-SOURCE FOR III-V COMPOUND SEMICONDUCTORS [J].

MIYAUCHI, E ;

ARIMOTO, H ;

BAMBA, Y ;

TAKAMORI, A ;

HASHIMOTO, H .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1985, 6 (1-2) :183-189

[4]

Mueller E.W., 1969, FIELD ION MICROSCOPY

[5]

NICOLET M, 1983, FORMATION CHARACTERI, V8

[6]

UMEMURA K, 1986, 17TH P S ION IMPL SU, P137

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