APPLICATION OF VANDERWAALS EPITAXY TO HIGHLY HETEROGENEOUS SYSTEMS

被引：77

作者：

SAIKI, K

UENO, K

SHIMADA, T

KOMA, A

机构：

来源：

JOURNAL OF CRYSTAL GROWTH | 1989年 / 95卷 / 1-4期

关键词：

D O I：

10.1016/0022-0248(89)90475-2

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

收藏

页码：603 / 606

页数：4

相关论文

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