PLASMA MODIFICATION OF POLY(ETHER SULFONE)

被引：28

作者：

HOPKINS, J ^{[1
]}

BADYAL, JPS ^{[1
]}

机构：

[1] UNIV DURHAM,DEPT CHEM,SCI LABS,DURHAM DH1 3LE,ENGLAND

来源：

MACROMOLECULES | 1994年 / 27卷 / 19期

关键词：

D O I：

10.1021/ma00097a033

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Surface treatment of poly(ether sulfone) by O2, H-2, He, Ne, Ar, and CF4 nonisothermal glow discharges has been investigated by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). The chemical and topographical modification of the surface is found to be strongly influenced by the type of feed gas employed.

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收藏

页码：5498 / 5503

页数：6

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