A GENERALIZED PLASMA-ETCHING MODEL

被引：18

作者：

ZAWAIDEH, E

KIM, NS

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 64卷 / 08期

关键词：

D O I：

10.1063/1.341335

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4199 / 4207

页数：9

共 17 条

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