RAMAN-SCATTERING STUDIES IN DILUTE AND CONCENTRATED A-SI1-XHX ALLOYS

被引:15
作者
MALEY, N [1 ]
LANNIN, JS [1 ]
SCOTT, BA [1 ]
机构
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
关键词
D O I
10.1016/0022-3093(83)90556-2
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:201 / 204
页数:4
相关论文
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