INSITU PULSED LASER DEPOSITION OF ND1.85CE0.15CUO4-Y

被引：6

作者：

HORWITZ, JS ^{[1
]}

CHRISEY, DB ^{[1
]}

OSOFSKY, MS ^{[1
]}

GRABOWSKI, KS ^{[1
]}

VANDERAH, TA ^{[1
]}

机构：

[1] USN,CTR WEAP,DEPT RES,DIV CHEM,CHINA LAKE,CA 93555

来源：

JOURNAL OF APPLIED PHYSICS | 1991年 / 70卷 / 02期

关键词：

O THIN-FILMS; SUPERCONDUCTIVITY; GROWTH;

D O I：

10.1063/1.349691

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Thin films of the electron-charge-carrying high-temperature superconductor, Nd1.85Ce0.15CuO4-y have been deposited by pulsed laser deposition on to <100> MgO and SrTiO3 substrates. Film composition, structure, and transport properties were measured as a function of deposition conditions (substrate temperature, oxygen deposition pressure, and postdeposition annealing conditions). C-axis oriented, single-phase films were formed at high substrate temperatures (900-degrees-C) in high background pressures of oxygen (200 mTorr), but were semiconducting when quenched to room temperature in either oxygen or nitrogen. A reduced oxygen background pressure during deposition at 900-degrees-C resulted in films thate were transparent and insulating due to the loss of copper. Films which were deposited at 900-degrees-C (P(oxygen) greater-than-or-equal-to 200 mTorr) and then slowly cooled in a vacuum were superconducting with a maximum T(c) (onset) of 15 K and T(c)(R = 0) of 11 K.

引用

页码：1045 / 1047

页数：3

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