ION ETCHING FOR PATTERN DELINEATION

被引：95

作者：

MELLIARSMITH, CM ^{[1
]}

机构：

[1] BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1976年 / 13卷 / 05期

关键词：

D O I：

10.1116/1.569037

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1008 / 1022

页数：15

共 104 条

[1] COLLECTION AND SPUTTERING EXPERIMENTS WITH NOBLE GAS IONS
ALMEN, O
BRUCE, G
[J]. NUCLEAR INSTRUMENTS & METHODS, 1961, 11 (02): : 257 - 278
[2] SPUTTERING EXPERIMENTS IN THE HIGH ENERGY REGION
ALMEN, O
BRUCE, G
[J]. NUCLEAR INSTRUMENTS & METHODS, 1961, 11 (02): : 279 - 289
[3] PLASMA DIAGNOSTICS AND ENERGY TRANSPORT OF A DC DISCHARGE USED FOR SPUTTERING
BALL, DJ
[J]. JOURNAL OF APPLIED PHYSICS, 1972, 43 (07) : 3047 - &
[4] PREDICTION OF ION-BOMBARDED SURFACE TOPOGRAPHIES USING FRANKS KINEMATIC THEORY OF CRYSTAL DISSOLUTION
BARBER, DJ
FRANK, FC
MOSS, M
STEEDS, JW
TSONG, IST
[J]. JOURNAL OF MATERIALS SCIENCE, 1973, 8 (07) : 1030 - 1040
[5] SECONDARY PROCESSES IN EVOLUTION OF SPUTTER-TOPOGRAPHIES
BAYLY, AR
[J]. JOURNAL OF MATERIALS SCIENCE, 1972, 7 (04) : 404 - &
[6] BAYLY AR, 1973, OPT LASER TECH, P205
[7] BAZZARRE DF, 1974, J ELECTROCHEM SOC, V121, pC110
[8] SPUTTER MACHINING OF PIEZOELECTRIC TRANSDUCERS
BEECHAM, D
[J]. JOURNAL OF APPLIED PHYSICS, 1969, 40 (11) : 4357 - &
[9] Bernheim M., 1973, International Journal of Mass Spectrometry and Ion Physics, V12, P93, DOI 10.1016/0020-7381(73)80090-7
[10] BREWER GR, 1971, IEEE SPECTRUM JAN, P23