EPITAXIAL-GROWTH AND ELECTRODE IMPEDANCE OF COPPER ELECTRODEPOSITS

被引:68
作者
CHASSAING, E
WIART, R
机构
关键词
D O I
10.1016/0013-4686(84)87124-8
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:649 / 660
页数:12
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