X-RAY-CHARACTERISTICS OF ATOMICALLY FLAT GOLD-FILMS DEPOSITED BY ICB

被引：14

作者：

YAMADA, I

TAKAOKA, GH

USUI, H

SATOH, F

ITOH, Y

YAMASHITA, K

KITAMOTO, S

NAMBA, Y

HASHIMOTO, Y

MAEYAMA, Y

MACHIDA, K

机构：

[1] INST SPACE & ASTRONAUT SCI,SAGAMIHARA,KANAGAWA 229,JAPAN

[2] OSAKA UNIV,DEPT PHYS,TOYONAKA,OSAKA 560,JAPAN

[3] CHUBU UNIV,DEPT MECH ENGN,KASUGAI,AICHI 487,JAPAN

[4] MITSUBISHI ELECTR CO,MFG DEV LAB,AMAGASAKI,HYOGO 661,JAPAN

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1991年 / 59卷

关键词：

D O I：

10.1016/0168-583X(91)95208-U

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Atomically flat Au films on SiO2 have been deposited by an ionized cluster beam (ICB). The roughness of the film surface was reduced with increasing thickness at high acceleration voltage. Average roughness of the film deposited at I(e) = 100 mA and V(a) = 3 kV was 0.25 nm by analysis of X-ray reflectivity. The films have shown high reflectivity of X-rays (Al K-alpha) at a wavelength of 0.834 nm. The reflectivity was 95% at the incident angle of 0.75-degrees and was 10% larger than the value calculated by using Fresnel's equation, in which the surface roughness was assumed to be zero.

引用

页码：216 / 218

页数：3